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US 2017/0323810 A1Published application
Single use rinse in a linear marangoni drier
AssigneeApplied Materials, Inc.
InventorBrian J. BROWN
Life of this patent
Estimating the term…
Abstract
An apparatus for drying of wet substrates in a post CMP cleaning apparatus is provided. The apparatus provides a waterfall or shallow reservoir of rinsing solution, such as DIW, through which a substrate may be lifted. A solvent vapor may be provided at the rinsing solution interface on the substrate, such as in a Marangoni process. In certain embodiments, the volume of solution through which the substrate is lifted is reduced, which may provide for reduced or eliminated particle reattachment to the substrate.
Claims20
A substrate processing apparatus, comprising:
- a body defining a volume configured to accommodate a substrate;
- a plurality of rinse fluid members positioned to provide a waterfall of rinse fluid in the volume, the plurality of rinse fluid members comprising:
- a first conduit coupled to a first sidewall of the body and extending from the first sidewall into the volume;
- a second conduit coupled to a second sidewall of the body and extending from the second sidewall into the volume opposite the first conduit, wherein each of the first conduit and the second conduit comprise a parallel top portion and bottom portion and parallel sidewalls;
- a plurality of wetting spray members positioned to provide rinsing fluid below the plurality of rinse fluid members;
- and
- a plurality of solvent spray members positioned to provide a drying agent above the plurality of rinse fluid members.
4 more elements
A substrate processing apparatus, comprising:
- a body defining a volume configured to accommodate a substrate;
- a plurality of rinse fluid members positioned to provide a waterfall of rinse fluid in the volume, the plurality of rinse fluid members comprising:
- a first conduit coupled to a first sidewall of the body and extending from the first sidewall into the volume;
- a second conduit coupled to a second sidewall of the body and extending from the second sidewall into the volume opposite the first conduit, wherein each of the first conduit and the second conduit comprise a parallel top portion and bottom portion and parallel sidewalls, and wherein each of the first conduit and the second conduit has a width greater than a diameter of the substrate;
- a plurality of nozzles positioned to provide rinsing fluid for coverage across an area of the substrate below the plurality of rinse fluid members;
- and
- a plurality of solvent spray members positioned to provide a drying agent above the plurality of rinse fluid members.
4 more elements
A substrate processing apparatus, comprising:
- a body defining a volume, the body having a first sidewall and a second sidewall disposed opposite the first sidewall;
- a plurality of rinse fluid members positioned to provide a downward waterfall flow of rinse fluid within the volume, wherein the plurality of rinse fluid members comprise;
- a first conduit coupled to the first sidewall of the body and extending from the first sidewall into the volume;
- a second conduit coupled to the second sidewall of the body and extending from the second sidewall into the volume opposite the first conduit, wherein each of the first conduit and the second conduit comprise a parallel top portion and bottom portion and parallel sidewalls, and wherein the first conduit and the second conduit are disposed in a common plane;
- a plurality of nozzles positioned to provide rinsing fluid for coverage across an area of the substrate below the plurality of rinse fluid members;
- a plurality of solvent spray members positioned to provide a drying agent above the plurality of rinse fluid members;
- and
- a drain coupled to the body opposite the plurality of solvent spray members, wherein the drain is configured to continually remove rinse fluid provided by the plurality of rinse fluid members from the volume.
5 more elements
Dependencies are inferred from the claim text.