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US 2017/0321168 A1Published application
Polyimide-based resin film cleaning liquid, method for cleaning polyimide-based resin film, method for producing polyimide coating, method for producing filter, filter medium, or filter device, and method for producing chemical solution for lithography
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorIsao HIRANO
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Abstract
A polyimide-based resin film cleaning liquid includes at least one solvent selected from the group consisting of a hydroxy aliphatic carboxylic acid ester, an aliphatic carboxylic acid ester, a chain or cyclic ketone, an alkylene glycol monoalkyl ether, an alkylene glycol monoalkyl ether acetate, and an aprotic polar solvent other than these solvents.
Claims15
A polyimide-based resin film cleaning liquid comprising:
- at least one solvent selected from the group consisting of a hydroxy aliphatic carboxylic acid ester, an aliphatic carboxylic acid ester, a chain or cyclic ketone, an alkylene glycol monoalkyl ether, an alkylene glycol monoalkyl ether acetate, and an aprotic polar solvent other than these solvents.
A method for producing a chemical solution for lithography, the method comprising:
- passing a polyimide-based resin film cleaning liquid comprising at least one solvent selected from the group consisting of a hydroxy aliphatic carboxylic acid ester, an aliphatic carboxylic acid ester, a chain or cyclic ketone, an alkylene glycol monoalkyl ether, an alkylene glycol monoalkyl ether acetate, and an aprotic polar solvent other than these solvents, through a filter device provided with a filter comprising a polyimide coating, and then allowing a chemical solution for lithography for treatment to pass through the filter device.
Dependencies are inferred from the claim text.