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US 2017/0318394 A1Published application
Electret Element, Microphone Having Electret Element Mounted Therein and Electret Element Manufacturing Method
AssigneesNational University Corporation Shizuoka University, Kabushiki Kaisha Saginomiya Seisakusho
InventorsGen HASHIGUCHI, Yuki NISHIMORI, Shinichi ARIOKA, Masato SUZUKI, Kazunori ISHIBASHI
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Abstract
An electret element includes: an electret film that contains silicon oxide; and a protective film formed over the electret film and constituted of aluminum oxide deposited through an atomic layer deposition method.
Claims10
An electret element comprising:
- an electret film that contains silicon oxide;
- and
- a protective film formed over the electret film and constituted of aluminum oxide deposited through an atomic layer deposition method.
An electret element manufacturing method, comprising:
- forming a silicon oxide film containing alkali ions on a substrate,
- depositing aluminum oxide through an atomic layer deposition method onto the silicon oxide film;
- and
- inducing electric polarization by causing the alkali ions to move through a voltage application while heating the substrate.
1 more element
Dependencies are inferred from the claim text.