US 2017/0291199 A1 · FLUORINE REDUCTION WITH SCOPE WITH CONTROLLED OXIDATION

Abstract

A method for removing halogen from a surface of a substrate is described herein. The method described herein includes flowing oxygen gas and an inert gas such as nitrogen gas into a RPS. The gases in the RPS are energized to form oxygen radicals and nitrogen radicals. The oxygen and nitrogen radicals are used to remove halogen content on the surface of the substrate. The chamber pressure of the halogen content removal process is very low, ranging from about 50 mTorr to about 100 mTorr. By using oxygen gas and an inert gas and with a low chamber pressure, the halogen content on the surface of the substrate is reduced while keeping the oxidation level of the surface of the substrate to at most 10 Angstroms.

Claims20

Dependent claims

A method, comprising:

placing a substrate into a processing chamber;
flowing an oxygen gas and an inert gas into a remote plasma source coupled to the processing chamber;
energizing the oxygen gas and the inert gas to form radicals;
flowing the radicals into the processing chamber;
and
removing halogen content on a surface of the substrate using the radicals, wherein an oxide layer is formed on the surface of the substrate, and the oxide layer has a thickness of at most 10 Angstroms.

3 more elements

Dependencies are inferred from the claim text.

Facts

Application

15/485,105Filed 11 Apr 2017

Priority

12 Apr 2016

Published

12 Oct 2017

Term ends

Not estimatedThe source records don’t support an estimate.

Classification5 codes

H10P 70/20
Cleaning of wafers, substrates or parts of devices: cleaning during device manufacture
H10W 10/014
Of isolation regions comprising dielectric materials: using trench refilling with dielectric materials, e.g. shallow trench isolations
H10W 10/17
Isolation regions comprising dielectric materials: formed using trench refilling with dielectric materials, e.g. shallow trench isolations
H10P
Generic processes or apparatus for the manufacture or treatment of devices covered

Fluorine reduction with scope with controlled oxidation

Life of this patent

Fluorine reduction with scope with controlled oxidation

Life of this patent

Abstract

Claims20