Acoustic resonator including monolithic piezoelectric layer having opposite polarities
AssigneeAvago Technologies General IP (Singapore) Pte. Ltd.
InventorsKevin J. Grannen, Chris Feng, John Choy
Life of this patent
Estimating the term…
Loading patent…
AssigneeAvago Technologies General IP (Singapore) Pte. Ltd.
InventorsKevin J. Grannen, Chris Feng, John Choy
Estimating the term…
A method is provided for forming a piezoelectric layer during a corresponding deposition sequence. The method includes sputtering aluminum nitride onto a sputtering substrate inside a reaction chamber having a gas atmosphere, the gas atmosphere initially including nitrogen gas and an inert gas, causing growth of the piezoelectric layer with a polarity in a negative direction. The method further includes adding a predetermined amount of oxygen containing gas to the gas atmosphere over a predetermined period of time, while continuing the sputtering of the aluminum nitride onto the sputtering substrate during a remainder of the deposition sequence, such that the piezoelectric layer is monolithic. The predetermined amount of oxygen containing gas causes the polarity of the aluminum nitride piezoelectric layer to invert from the negative direction to a positive direction, opposite the negative direction.
A method of forming a piezoelectric layer during a corresponding deposition sequence, the method comprising:
A method of forming a bulk acoustic wave (BAW) resonator, comprising:
A method of forming a piezoelectric layer of aluminum nitride (AlN), doped with a rare earth element, during a corresponding deposition sequence, the method comprising:
Dependencies are inferred from the claim text.