Laminated film and process for manufacturing the same
AssigneeSumitomo Chemical Company, Limited
InventorYutaka ITO
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AssigneeSumitomo Chemical Company, Limited
InventorYutaka ITO
Estimating the term…
An object of the present invention is to provide a laminated film which can prevent transmission of the water vapor at the high level, and can suppress prevention of dark spots over a long period of time when used as a supporting substrate of an electronic device such as an organic EL element, and the present invention provides a laminated film comprising at least a gas barrier layer and an inorganic polymer layer being laminated on a resin substrate, wherein the arithmetic average height (Sa) of a surface of the inorganic polymer layer is 20 nm or less, and the NH3 gas generation amount per unit mass of the inorganic polymer layer when the laminated film comprising the inorganic polymer layer is accommodated in a sample chamber, and the interior of the sample chamber is heated at 85° C. for 1 hour while the humidified air at 25° C. and 85% RH is flown through the sample chamber is 5000 mass ppm or less.
A laminated film comprising at least a gas barrier layer and an inorganic polymer layer being laminated on a resin substrate, wherein
A process for manufacturing a laminated film comprising at least a gas barrier layer and an inorganic polymer layer being laminated on a resin substrate, comprising:
Dependencies are inferred from the claim text.