Enhanced substrate contact for mos transistor in an soi substrate, in particular an fdsoi substrate
AssigneeSTMicroelectronics S.r.l.
InventorsSotirios Athanasiou, Philippe Galy
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AssigneeSTMicroelectronics S.r.l.
InventorsSotirios Athanasiou, Philippe Galy
Estimating the term…
An integrated electronic device includes a semiconductive film above a buried insulating layer that is situated above a supporting substrate. An active zone is delimited within the semiconductive film. A MOS transistor supported within the active zone includes a gate region situated above the active zone. The gate region includes a rectilinear part situated between source and drain regions. The gate region further includes a forked part extending from the rectilinear part. A raised semiconductive region situated above the active zone is positioned at least partly between portions of the forked part. A substrate contact for the transistor is electrically coupled to the raised semiconductive region.
A method for producing at least one substrate contact for an MOS transistor produced in and on an active zone of a substrate of silicon on insulator type, comprising:
An integrated electronic device, comprising:
A device, comprising:
Dependencies are inferred from the claim text.