Substrate processing apparatus and substrate processing method

A substrate processing method comprising:

• a substrate rotating step of rotating a substrate while holding it in a horizontal orientation by clamping a peripheral edge portion of the substrate by means of a substrate holding unit arranged inside a chamber;
• a processing fluid supplying step of supplying a processing fluid to a front surface of the substrate being rotated in the substrate rotating step;
• a transferring step of transferring from the substrate holding unit to a substrate heating unit inside the chamber after ending the substrate rotating step;
• and
• a substrate heating step of heating the substrate by bringing the lower surface of the substrate in contact with the heating surface, in a state where a lower surface of the substrate faces a heating surface of the substrate heating unit and an outermost periphery of the substrate overlaps with the heating surface in top view.