Electrostatic chuck device
AssigneeSumitomo Osaka Cement Co., Ltd.
InventorsHitoshi KOUNO, Kentaro TAKAHASHI, Fumihiro GOBOU
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AssigneeSumitomo Osaka Cement Co., Ltd.
InventorsHitoshi KOUNO, Kentaro TAKAHASHI, Fumihiro GOBOU
Estimating the term…
The present invention provides an electrostatic chuck device capable of increasing the electrostatic adsorptive force for a focus ring and uniformly cooling the focus ring. In an electrostatic chuck device (10) of the present invention, a mounting table (11) has a holder (15) being provided in the periphery of a placing surface (24a) along the circumferential direction of a focus ring (12) and electrostatically adsorbing the focus ring (12), the holder (15) has a pair of banks (16) being provided in the circumferential direction and being for placing the focus ring (12) thereon, and an annular groove (17) formed between these banks, and, in at least a bank (16A) on an outer circumferential position of the focus ring (12) among the pair of the banks (16), a micro-protruding part including a plurality of micro-protrusions is formed on a surface facing the focus ring (12), or convex parts (18) are provided on a bottom (17a) of the groove (17). The convex parts (18) do not come into contact with the focus ring, and the pair of the banks (16) or the plurality of the micro-protrusions comes into contact with the focus ring (12) and electrostatically adsorbs the focus ring (12) in coordination with the convex parts (18).
An electrostatic chuck device, comprising:
An electrostatic chuck device, comprising:
Dependencies are inferred from the claim text.