Substrate treatment method, computer storage medium and substrate treatment system

A computer-readable storage medium storing a program running on a computer of a control unit controlling a substrate treatment system to cause the substrate treatment system to perform a substrate treatment method of treating a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer,

• the substrate treatment method comprising:
• a resist pattern formation step of forming a predetermined resist pattern by a resist film on the substrate;
• a thin film formation step of forming a thin film for suppressing deformation of the resist pattern on a surface of the resist pattern;
• a block copolymer coating step of applying a block copolymer to the substrate after the formation of the thin film;
• and
• a polymer separation step of phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer.

A substrate treatment system of treating a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer, the substrate treatment system comprising:

• a resist coating apparatus that applies a resist film on a substrate;
• a developing treatment apparatus that develops the resist film subjected to exposure processing to form a resist pattern;
• a thin film forming apparatus that forms a thin film for suppressing deformation of the resist pattern on a surface of the resist pattern;
• a block copolymer coating apparatus that applies the block copolymer to the substrate after the formation of the thin film;
• and
• a polymer separation apparatus that phase-separates the block copolymer into the hydrophilic polymer and the hydrophobic polymer.