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AssigneeTokyo Electron Limited
InventorsYuuki KIKUCHI, Hiroyuki NAGAI, Yoshihiro HIROTA, Mikio SUZUKI
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A metal hard mask for etching an etching target film that is present on a target object to be processed is formed of an amorphous alloy film that is formed by a thin film formation technique. It is preferable to use a physical vapor deposition method as the thin film formation technique, and sputtering is suitable for the use among physical vapor deposition methods. This metal hard mask is obtained by forming an amorphous alloy film on the etching target film by a thin film formation technique and patterning the amorphous alloy film.
A metal hard mask for etching an etching target film formed on a target object to be processed, the metal hard mask comprising:
A method of manufacturing a metal hard mask for etching an etching target film formed on a target object to be processed, the method comprising:
Dependencies are inferred from the claim text.