Forming method of hard mask, forming apparatus of hard mask and recording medium

A forming apparatus of a hard mask, comprising:

• a substrate holding unit configured to hold a substrate having a non-plateable material portion and a plateable material portion formed on a surface thereof;
• a catalyst imparting unit configured to impart a catalyst selectively to the plateable material portion by performing a catalyst imparting processing on the substrate;
• and
• a plating liquid supply unit configured to form a hard mask layer selectively on the plateable material portion by supplying a plating liquid onto the substrate,
• wherein the non-plateable material portion is made of SiO2 as a main component, and
• the plateable material portion is made of a material including, as a main component, a material containing at least one of a OCHx group and a NHx group, a metal material containing Si as a main component, a catalyst metal material, or a material containing carbon as a main component.