Imprint resist and substrate pretreatment for reducing fill time in nanoimprint lithography

A nanoimprint lithography method comprising:

• disposing a pretreatment composition on a substrate to form a pretreatment coating on the substrate, wherein the pretreatment composition comprises a first polymerizable component;
• disposing discrete portions of imprint resist on the pretreatment coating, each discrete portion of the imprint resist covering a target area of the substrate, wherein the imprint resist is a polymerizable composition and comprises at least one of a fluorinated surfactant and a fluorinated polymerizable component;
• forming a composite polymerizable coating on the substrate as each discrete portion of the imprint resist spreads beyond its target area, wherein the composite polymerizable coating comprises a mixture of the pretreatment composition and the imprint resist;
• contacting the composite polymerizable coating with a surface of a nanoimprint lithography template;
• and
• polymerizing the composite polymerizable coating to yield a composite polymeric layer on the substrate,
• wherein the interfacial surface energy between the pretreatment composition-and air exceeds the interfacial surface energy between the imprint resist and air by at least 1 mN/m, and the contact angle of the imprint resist on the surface of the nanoimprint lithography template is less than 15°.