Semiconductor device manufacturing method and recording medium

A non-transitory computer-readable recording medium storing a program that causes a computer to perform a process, in a substrate processing apparatus including a substrate chamber having a plasma generation space where a supplied nitrogen-containing gas is plasma-exited and a substrate process space where a substrate is mounted at the time of processing the substrate in communication with the plasma generation space;

• an inductive coupling structure which is installed at an outer periphery of the plasma generation space and is configured by a coil and an impedance matching circuit connected to the coil, wherein an electric field combining the coil and the impedance matching circuit has a length of an integer multiple of a wavelength of an applied high-frequency power;
• and a substrate mounting table configured to mount the substrate at a position under a lower end of the coil, the process comprising;
• mounting the substrate on the substrate mounting table;
• supplying the nitrogen-containing gas into the substrate process chamber;
• starting a plasma excitation of the nitrogen-containing gas in the plasma generation space by applying the high-frequency power to the coil;
• and
• nitriding a surface of the substrate with an active species containing a nitrogen element generated by the plasma excitation,
• wherein in the act of nitriding the surface of the substrate, an internal pressure of the substrate process chamber is set to fall within a range of 1 to 100 Pa.