Substrate processing apparatus, control method of substrate processing apparatus and substrate processing system

A substrate processing apparatus which performs a processing of removing a film on a peripheral portion of a substrate, the substrate processing apparatus comprising:

• a rotating/holding unit configured to rotate the substrate while attracting and holding the substrate from a bottom surface thereof;
• a processing liquid supply unit configured to supply a processing liquid for removing the film onto the peripheral portion of the substrate while the substrate is being rotated by the rotating/holding unit;
• and
• an imaging unit configured to image the peripheral portion of the substrate,
• wherein the imaging unit is allowed to set a plurality of different imaging conditions selectively and is configured to image the peripheral portion of the substrate by using the imaging condition selected depending on a kind of the film of the substrate.

A substrate processing system including a substrate processing apparatus configured to perform a processing of removing a film on a peripheral portion of a substrate;

• a measurement processing device configured to perform a measurement processing based on an image;
• and an information processing device configured to manage information upon the measurement processing,
• wherein the substrate processing apparatus comprises:
• a rotating/holding unit configured to rotate the substrate while attracting and holding the substrate from a bottom surface thereof;
• a processing liquid supply unit configured to supply a processing liquid for removing the film onto the peripheral portion of the substrate while the substrate is being rotated by the rotating/holding unit;
• and
• an imaging unit configured to image the peripheral portion of the substrate,
• wherein the information processing device comprises:
• a controller configured to acquire information upon a kind of the film of the substrate and select a measurement setting corresponding to the acquired kind of the film from a plurality of measurement settings, and
• wherein the measurement processing device comprises:
• a controller configured to control the imaging unit to image the peripheral portion of the substrate by using the measurement setting selected by the information processing device.