Systems and methods for performing edge ring characterization
AssigneeLam Research Corporation
InventorsMarcus Musselman, Andrew D. Bailey, III, Jon McChesney
Life of this patent
Estimating the term…
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AssigneeLam Research Corporation
InventorsMarcus Musselman, Andrew D. Bailey, III, Jon McChesney
Estimating the term…
A substrate support in a substrate processing system includes an inner portion arranged to support a substrate, an edge ring surrounding the inner portion, and a controller. The controller at least one of lowers the edge ring to selectively cause the edge ring to engage the substrate and raises the inner portion to selectively cause the edge ring to engage the substrate. The controller determines when the edge ring engages the substrate and calculates at least one characteristic of the substrate processing system based on the determination of when the edge ring engages the substrate.
A substrate support in a substrate processing system, the substrate support comprising:
A method of determining characteristics a substrate processing system, the method comprising:
Dependencies are inferred from the claim text.