Lithography apparatus, control method therefor, and method of manufacturing article
AssigneeCanon Kabushiki Kaisha
InventorAtsushi Takagi
Life of this patent
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Abstract
A lithography apparatus includes an original holder configured to hold and move an original, a measurement unit configured to measure a misalignment amount of the original with respect to the original holder, and a controller configured to control movement of the original holder. The controller repeatedly performs preliminary driving for moving the original holder before performing the pattern formation. At this time, if the misalignment amount measured by the measurement unit converges to a predetermined convergence value while the preliminary driving is repeatedly performed, the controller ends the preliminary driving.
Claims12
A lithography apparatus for performing pattern formation by transferring a pattern of an original onto a substrate, comprising:
- an original holder configured to hold and move the original;
- a measurement unit configured to measure a misalignment amount of the original with respect to the original holder;
- and
- a controller configured to control movement of the original holder,
- wherein the controller repeatedly performs preliminary driving for moving the original holder before performing the pattern formation, and controls the movement of the original holder so as to end the preliminary driving if the misalignment amount measured by the measurement unit converges to a predetermined convergence value while the preliminary driving is repeatedly performed.
A lithography apparatus for performing pattern formation on a substrate, comprising:
- a substrate holder configured to hold and move the substrate;
- a measurement unit configured to measure a misalignment amount of the substrate with respect to the substrate holder;
- and
- a controller configured to control movement of the substrate holder,
- wherein the controller repeatedly performs preliminary driving for moving the substrate holder before performing the pattern formation, and controls the movement of the substrate holder so as to end the preliminary driving if the misalignment amount measured by the measurement unit converges to a predetermined convergence value while the preliminary driving is repeatedly performed.
A control method for a lithography apparatus for performing pattern formation by transferring a pattern of an original held by an original holder onto a substrate, comprising:
- repeatedly performing preliminary driving for moving the original holder before performing the pattern formation;
- measuring a misalignment amount of the original with respect to the original holder while the preliminary driving is repeatedly performed;
- and
- ending the preliminary driving if the measured misalignment amount converges to a predetermined convergence value.
A control method for a lithography apparatus for performing pattern formation on a substrate held by a substrate holder, comprising:
- repeatedly performing preliminary driving for moving the substrate holder before performing the pattern formation;
- measuring a misalignment amount of the substrate with respect to the substrate holder while the preliminary driving is repeatedly performed;
- and
- ending the preliminary driving if the measured misalignment amount converges to a predetermined convergence value.
A method of manufacturing an article, comprising:
- performing pattern formation by transferring a pattern of an original onto a substrate using a lithography apparatus;
- processing the substrate on which the pattern has been formed in the performing;
- and
- manufacturing the article from the processed substrate,
- wherein the lithography apparatus includes
- an original holder configured to hold and move the original,
- a measurement unit configured to measure a misalignment amount of the original with respect to the original holder, and
- a controller configured to control movement of the original holder, and
- the controller repeatedly performs preliminary driving for moving the original holder before performing the pattern formation, and controls the movement of the original holder so as to end the preliminary driving if the misalignment amount measured by the measurement unit converges to a predetermined convergence value while the preliminary driving is repeatedly performed.
A method of manufacturing an article, comprising:
- performing pattern formation by transferring a pattern of an original onto a substrate using a lithography apparatus;
- processing the substrate on which the pattern has been formed in the performing;
- and
- manufacturing the article from the processed substrate,
- wherein the lithography apparatus includes
- a substrate holder configured to hold and move the substrate,
- a measurement unit configured to measure a misalignment amount of the substrate with respect to the substrate holder, and
- a controller configured to control movement of the substrate holder, and
- the controller repeatedly performs preliminary driving for moving the substrate holder before performing the pattern formation, and controls the movement of the substrate holder so as to end the preliminary driving if the misalignment amount measured by the measurement unit converges to a predetermined convergence value while the preliminary driving is repeatedly performed.
Dependencies are inferred from the claim text.