Mask protection device, exposure apparatus, and method for manufacturing device
AssigneeNikon Corporation
InventorKazuya OTA
Life of this patent
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AssigneeNikon Corporation
InventorKazuya OTA
Estimating the term…
A reticle protection device capable of keeping a reticle therein is provided with an inner pod capable of keeping the reticle therein; an outer pod capable of keeping the inner pod therein; an electroconductive movable contact portion provided on at least one of the inner pod and the outer pod and being capable of coining into contact with an electroconductive film of the reticle; and a leaf spring for achieving electric conduction of the contact portion to at least one of the inner pod and the outer pod. The reticle is kept in the inner pod and the inner pod is kept in the outer pod, thereby enabling stable grounding of the reticle.
A mask protection device capable of keeping a mask therein, comprising:
An exposure apparatus for illuminating a pattern with an exposure beam to expose an object with the exposure beam via the pattern and via a projection optical system, while moving the object, comprising:
Dependencies are inferred from the claim text.