Organic processing liquid and pattern forming method
AssigneeFUJIFILM Corporation
InventorsToru TSUCHIHASHI, Hideaki TSUBAKI, Kei YAMAMOTO
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Abstract
Disclosed herein are an organic processing liquid for resist film patterning which is capable of suppressing the occurrence of defects in resist patterns, and a pattern forming method. Provided is an organic processing liquid for resist film patterning, which is used to carry out at least one of developing or cleaning of a resist film obtained from an actinic ray-sensitive or radiation-sensitive composition, the liquid including an organic solvent, in which the content of an oxidant in the organic processing liquid is 10 mmol/L or less.
Claims20
An organic processing liquid for resist film patterning, which is used to carry out at least one of developing or cleaning of a resist film obtained from an actinic ray-sensitive or radiation-sensitive composition, the liquid comprising:
- an organic solvent,
- wherein the content of an oxidant in the organic processing liquid is 10 mmol/L or less.
Dependencies are inferred from the claim text.