Development method, development device, and non-transitory computer-readable storage medium

A development device comprising:

• a substrate holding unit that horizontally holds a substrate for manufacturing a semiconductor device after undergoing formation of a resist film and exposure;
• a rotating mechanism that rotates the substrate holding unit and thereby rotates the substrate around a central axis;
• a developing solution supply unit that supplies a developing solution to a surface of the substrate;
• and
• a control unit that outputs control signals to execute a step of supplying the developing solution to the substrate to perform development, then execute a step of increasing revolution speed to rotate the substrate in a first rotational direction so as to spin off and remove part of the developing solution from the substrate, and then execute a step of rotating the substrate in a second rotational direction reverse to the first rotational direction so as to spin off and remove the developing solution remaining on the substrate from the substrate.