US 2017/0285476 A1 · CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION

Abstract

A chemically amplified positive-type photosensitive resin composition that can be well developed with an aqueous basic solution having low pH, a substrate with a photosensitive film formed from the composition, and a method for patterned resist film formation using the composition. The composition includes an acid generator that produces an acid upon irradiation with an active ray or radiation; a resin whose solubility in alkali increases under the action of acid; and an organic solvent, in which a predetermined amount of an alkali-soluble resin soluble in an aqueous basic solution having a pH of 12 and containing alkali-soluble groups with hydrogen atoms in at least a part thereof is substituted with an acid-dissociative dissolution-controlling group contained in the resin.

Claims6

Dependent claims

A chemically amplified positive-type photosensitive resin composition comprising:

an acid generator (A) that produces an acid upon irradation with an active ray or radiation;
a resin (B) whose solubility in alkali increases under the action of acid;
and
an organic solvent (S), wherein
the resin (B) contains a first resin (B1),
wherein the first resin (B1) is an alkali-soluble resin soluble in an aqueous basic solution having a pH value of 12 and containing alkali-soluble groups with hydrogen atoms in at least a part thereof which are substituted with an acid-dissociative dissolution-controlling group, and
wherein the ratio of the mass of the first resin (B1) to the mass of the resin (B) is more than 50% by mass.

4 more elements

Dependencies are inferred from the claim text.

Facts

Application

15/467,394Filed 23 Mar 2017

Priority

JP 2016-07098231 Mar 2016

Published

5 Oct 2017

Term ends

Not estimatedThe source records don’t support an estimate.

Classification14 codes

C08F 220/1808
With acrylic or methacrylic acids: c8-acrylate, e.g. isooctyl acrylate or 2-ethylhexyl acrylate
G03F 7/0045
Photosensitive materials: with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
G03F 7/0392
Macromolecular compounds which are photodegradable, e.g. positive electron resists: the macromolecular compound being present in a chemically…
G03F 7/0397
The macromolecular compound being present in a chemically amplified positive photoresist composition: the macromolecular compound having an…

Chemically amplified positive-type photosensitive resin composition

Life of this patent

Chemically amplified positive-type photosensitive resin composition

Life of this patent

Abstract

Claims6