Photosensitive resin composition, photosensitive resin laminate, resin pattern production method, cured film, and display device
AssigneeAsahi Kasei Kabushiki Kaisha
InventorsMayuki YOSHIDA, Satoshi SHIBUI
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AssigneeAsahi Kasei Kabushiki Kaisha
InventorsMayuki YOSHIDA, Satoshi SHIBUI
Estimating the term…
The present invention provides a photosensitive resin laminate in which (A) an alkali-soluble polymer, (B) a compound having an ethylenically unsaturated double bond, and (C) a photosensitive resin layer including a photopolymerization initiator are laminated on a support film. The photosensitive resin laminate is used in forming the protective film of a conductor part, the thickness of the photosensitive resin is 20 μm or less, and the cured product of the photosensitive resin layer satisfies conditions (1) to (3): (1) the crosslink density is 1,000 mol/m3-8,000 mol/m3; (2) the peak top value of Tan δ is 0.4 or greater; and (3) the refractive index at a wavelength of 532 nm is 1.50-1.60.
A photosensitive resin laminate comprising a support film, and a photosensitive resin layer including:
A photosensitive resin composition for a wiring protective film, including 30 mass % to 70 mass % of an alkali-soluble polymer (A), 20 mass % to 60 mass % of a compound having an ethylenic unsaturated double bond (B) and 0.1 mass % to 10 mass % of a photopolymerization initiator (C), wherein
Dependencies are inferred from the claim text.