Fluorine-containing composition, substrate for pattern formation, photodegradable coupling agent, pattern formation method and transistor production method

A fluorine-containing composition, comprising:

• a fluorine-containing compound represented by the following general formula (1), and a fluorine-based solvent:
• (wherein,
• X represents a halogen atom or alkoxy group,
• R1 represents a hydrogen atom or linear, branched or cyclic alkyl group having 1 to 10 carbon atoms,
• Rf1 and Rf2 respectively and independently represent a fluorinated alkoxy group, and
• n represents an integer of 0 or more).