US 2017/0285459 A1 · PHOTOMASK AND METHOD FOR MANUFACTURING COLUMN SPACER FOR COLOR FILTER USING THE SAME

Abstract

The present invention relates to a photomask and a method for manufacturing a column spacer for a color filter using the same, and according to one aspect of the present invention, a photomask is provided, which comprises a central region having a first transmittance, a first perimeter region surrounding the central region and having a second transmittance lower than the first transmittance, and a second perimeter region surrounding the first perimeter region and having the first transmittance.

Claims13

Dependent claims

A photomask comprising

a central region having a first transmittance;
a first perimeter region surrounding said central region and having a second transmittance lower than the first transmittance;
and
a second perimeter region surrounding the first perimeter region and having the first transmittance.

1 more element

Dependencies are inferred from the claim text.

Facts

Application

15/476,267Filed 31 Mar 2017

Priority

KR 10-2016-003879631 Mar 2016

Published

5 Oct 2017

Term ends

Not estimatedThe source records don’t support an estimate.

Classification8 codes

G03F 1/38
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles…
G03F 1/50
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles…
G03F 1/58
Absorbers, e.g. of opaque materials: having two or more different absorber layers, e.g. stacked multilayer absorbers
G03F 7/0007
Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor: filters, e.g.…

Photomask and method for manufacturing column spacer for color filter using the same

Life of this patent

Photomask and method for manufacturing column spacer for color filter using the same

Life of this patent

Abstract

Claims13