Laser ablation tooling via sparse patterned masks
Assignee3M Innovative Properties Company
InventorThomas R. Corrigan
Life of this patent
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Abstract
A sparse patterned mask for use in a laser ablation process to image a substrate. The mask has a plurality of apertures for transmission of light and non-transmissive areas around the apertures. The apertures individually form a portion of a complete pattern, and a plurality of apertures from one or more masks together form the complete pattern when the masks are imaged. Making a mask sparse provides for a path to remove debris from the substrate during the laser ablation process. Multiple interlaced sparse repeating patterns can create a more complex pattern with repeat distances larger than the individual patterns.
Claims16
A method for laser imaging a substrate using two or more sparse patterned masks in order to form a complete pattern in a surface of the substrate, comprising:
- imaging through the first mask a first pattern on the substrate, the first pattern leaving regions unexposed by the laser and having a first repeat distance;
- and
- imaging through the second mask a second pattern on the substrate, the second pattern being different from the first pattern and leaving regions unexposed by the laser and having a second repeat distance, and the imaging comprises exposing the substrate with the second pattern such that laser is only exposed to regions not exposed by the first pattern on the substrate and interlacing the second pattern with the first pattern,
- wherein the second pattern interlaced with the first pattern forms the complete pattern on the substrate, the complete pattern is different from both the first and second patterns, and the complete pattern has a greater repeat distance than the first and second repeat distances.
A method for laser imaging a substrate using two sparse patterned masks in order to form a complete pattern in a surface of the substrate, comprising:
- imaging the substrate through a first sparse mask having apertures for transmission of light and non-transmissive areas around the apertures in order to form a first pattern composed of first features in the substrate, comprising:
- imaging the first mask to form a portion of the first features;
- moving the first mask to a different position relative to the substrate;
- and
- repeating the imaging and moving steps to form the first pattern composed of the first features, wherein the first features comprise discontinuous repeating features on the substrate, and the first features collectively form the first pattern;
- and
- imaging the substrate through the second mask to form a second pattern composed of second features interlaced with the first features in the first pattern, comprising:
- imaging the second mask to form and interlace a portion of the second features in regions between the first features and the first pattern;
- moving the second mask to a different position relative to the substrate;
- and
- repeating the imaging and moving steps to form the second pattern composed of the second features,
- wherein the second pattern is different from the first pattern, and the second pattern composed of the second features merges with the first pattern composed of the first features to form continuous repeating features comprising the complete pattern,
- wherein the complete pattern is different from the first pattern and the second pattern, and the complete pattern repeats over a distance that is greater than a repeat distance of the first pattern and the second pattern.
Dependencies are inferred from the claim text.