Method of manufacturing electro-optical device, electro-optical device, and electronic apparatus
AssigneeSeiko Epson Corporation
InventorToru NIMURA
Life of this patent
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AssigneeSeiko Epson Corporation
InventorToru NIMURA
Estimating the term…
In a step of forming an element substrate of an electro-optical device, a layered structure, which includes a plurality of films having a film that forms pixel switching elements and a film that forms holding capacitors, is formed on one surface of the substrate, and, thereafter, a lens surface and a lens layer are formed on a second surface of the layered structure. Subsequently, after the substrate is removed by polishing and etching, pixel electrodes are formed on a side of a first substrate, on which the substrate is located, of the layered structure. Therefore, the holding capacitors are provided on a side opposite to a side of the pixel electrodes (side of a counter substrate) for the pixel switching elements.
A method of manufacturing an electro-optical device including an element substrate, on which pixel electrodes, pixel switching elements electrically connected to the pixel electrodes, and holding capacitors electrically connected to the pixel electrode are provided, a counter substrate on which common electrodes that face the pixel electrodes are provided, and an electro-optical layer which is provided between the element substrate and the counter substrate, the method comprising:
An electro-optical device comprising:
Dependencies are inferred from the claim text.