Array substrate and semiconductor device containing the same, and method for fabricating the same

An array substrate, comprising:

• a substrate having a display region with a plurality of pixel regions, each pixel region having two or more first regions;
• a common electrode line between two adjacent pixel regions;
• a gate line;
• a data line intersecting with the gate line;
• at least one of the gate line and the data line being in a second region between two adjacent first regions;
• and
• a pixel electrode having a hollowed-out pattern within a corresponding first region, pixel electrodes corresponding to the two or more first regions being a pixel electrode unit.

A method for fabricating an array substrate, comprising:

• providing a substrate having a display region with a plurality of pixel regions, each pixel region having two or more first regions, and a second region between two adjacent first regions;
• forming a gate line and a gate electrode of a thin-film transistor on a substrate, the gate line and the gate electrode of the thin-film transistor being formed in a same fabrication step;
• forming a first insulating layer;
• forming an active layer of the thin-film transistor, the active layer being located in an area where the gate line and a data line intersect;
• forming a data line, common electrode lines between two adjacent pixel regions, first electrodes, and a second electrode, at least one of the gate line and the data line being formed in the second region;
• forming a second insulating layer and first via holes, the first via holes being through the second insulating layer;
• and
• forming a pixel electrode with a hollowed-out pattern in the pixel region being connected to the first electrodes through the first via holes, the hollowed-out pattern corresponding to the first region.