US 2017/0284943 A1 · DETECTING VOIDS AND DELAMINATION IN PHOTORESIST LAYER

Abstract

A system for detecting a void in a photoresist layer can include: a detector, a processor, and a memory. The detector can be arranged to receive reflected light from a surface of a sample. The processor can be in electrical communication with the detector, The memory can store instructions that, when executed by the processor, can cause the processor to perform operations. The operations can comprise: receiving optical data from the detector, receiving calibrated data, and determining an existence of the void. the optical data can include information regarding a signature of the reflected light. The calibrated data can include information regarding a signature for a known sample of photoresist. The determination of the existence of the void can be based on a deviation of the optical data from the calibrated data.

Claims24

Dependent claims

A system for detecting a void in a photoresist layer, the system comprising:

a detector arranged to receive reflected light from a surface of a sample;
a processor in electrical communication with the detector;
and
a memory that stores instructions that, when executed by the processor, cause the processor to perform operations comprising:
receiving optical data from the detector, the optical data including information regarding a signature of the reflected light;
receiving calibrated data, the calibrated data including information regarding a signature for a known sample of photoresist, and
determining an existence of the void based on a deviation of the optical data from the calibrated data,

4 more elements

Dependencies are inferred from the claim text.

Detecting voids and delamination in photoresist layer

Life of this patent

Detecting voids and delamination in photoresist layer

Life of this patent

Abstract

Claims24