Semiconductor manufacturing device and semiconductor manufacturing method
AssigneeSumitomo Chemical Company, Limited
InventorHajime FUJIKURA
Life of this patent
Estimating the term…
Abstract
There is provided a semiconductor manufacturing device, including: a processing vessel; a partition wall that divides at least a part of a space in the processing vessel into a growth section and a cleaning section; a substrate holding member disposed in the growth section; a source gas supply system that supplies a source gas into the growth section; a cleaning gas supply system that supplies a cleaning gas into the cleaning section; and a heater that heats the growth section and the cleaning section.
Claims8
A semiconductor manufacturing device, comprising:
- a processing vessel;
- a partition wall that divides at least a part of a space in the processing vessel into a growth section and a cleaning section;
- a substrate holding member disposed in the growth section;
- a source gas supply system that supplies a source gas into the growth section;
- a cleaning gas supply system that supplies a cleaning gas into the cleaning section;
- and
- a heater that heats the growth section and the cleaning section.
A semiconductor manufacturing method, using a semiconductor manufacturing device comprising:
- a processing vessel;
- a partition wall that divides at least a part of a space in the processing vessel into a growth section and a cleaning section;
- a substrate holding member disposed in the growth section;
- a source gas supply system that supplies a source gas into the growth section;
- a cleaning gas supply system that supplies a cleaning gas into the cleaning section;
- and
- a heater that heats the growth section and the cleaning section,
- the method comprising the steps of:
- supplying the source gas from the source gas supply system to a substrate held by the substrate holding member disposed in the growth section to grow semiconductors on the substrate, and simultaneously supplying the cleaning gas from the cleaning gas supply system to a cleaning member disposed in the cleaning section to remove the semiconductors deposited on the cleaning member, in a state where the growth section and the cleaning section are heated by the heater.
Dependencies are inferred from the claim text.