US 2017/0283651 A1 · COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

Abstract

Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that a blend of two or more resins, where one resin has epoxy groups either pendant or fused to the polymer backbone. Preferred coating compositions include: 1) a first resin that comprises one or more epoxy reactive groups; and 2) a crosslinker resin that is distinct from the first resin and comprises epoxy groups.

Claims20

Dependent claims

A method for forming a photoresist relief image, comprising:

a) applying on a substrate a layer of a coating composition comprising:
1) a first resin that comprises one or more epoxy reactive groups, and wherein the first resin is a polyester and comprises polyester cyanurate groups;
and
2) a crosslinker resin that is distinct from the first resin and comprises epoxy groups.
b) applying a layer of a photoresist composition above the coating composition layer.

2 more elements

Dependencies are inferred from the claim text.

Facts

Application

15/088,091Filed 31 Mar 2016

Published

5 Oct 2017

Term ends

Not estimatedThe source records don’t support an estimate.

Classification17 codes

G03F 7/091
Characterised by structural details, e.g. supports, auxiliary layers: characterised by antireflection means or light filtering or absorbing means,…
C08G 63/183
Acids containing aromatic rings: terephthalic acids
C08G 63/189
Containing condensed aromatic rings: containing a naphthalene ring
C08G 63/6826
Derived from polycarboxylic acids and polyhydroxy compounds: dicarboxylic acids and dihydroxy compounds

Coating compositions for use with an overcoated photoresist

Life of this patent

Coating compositions for use with an overcoated photoresist

Life of this patent

Abstract

Claims20