Imprint apparatus, method of imprinting, method for producing article, and mold
AssigneeCanon Kabushiki Kaisha
InventorsTatsuya Hayashi, Kazuki Nakagawa, Yosuke Murakami
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Abstract
An imprint apparatus for forming a pattern of an imprint material on a process area of a substrate by using a mold including a patterned portion includes a heating unit. The heating unit heats the substrate such that a difference in shape between the process area and the patterned portion is reduced and heats the mold such that a difference in temperature between the mold and the heated substrate is reduced.
Claims20
An imprint apparatus for forming a pattern of an imprint material on a process area of a substrate by using a mold including a patterned portion, the apparatus comprising:
- a heating unit configured to heat the mold and the substrate,
- wherein the heating unit heats the substrate such that a difference in shape between the process area and the patterned portion is reduced, and
- wherein the heating unit heats the mold such that a difference in temperature between the mold and the heated substrate is reduced.
An imprint apparatus for forming a pattern of an imprint material on a process area of a substrate by using a mold including a patterned portion, the apparatus comprising:
- a heating unit configured to heat the mold and the substrate by applying light to the mold and the substrate,
- wherein the heating unit causes a light absorbing portion to absorb part of the light and applies light that has passed through the light absorbing portion and the mold to the substrate, such that a difference in shape between the process area and the patterned portion is reduced and a difference in temperature between the patterned portion and the process area is smaller than a threshold value.
An imprint apparatus for forming a pattern of an imprint material on a process area of a substrate by using a mold including a patterned portion, the apparatus comprising:
- a substrate heating unit configured to heat the substrate;
- and
- a mold heating unit configured to heat the mold,
- wherein the substrate heating unit heats the substrate such that a difference in shape between the process area and the patterned portion is reduced, and
- wherein the mold heating unit heats the mold such that a difference in temperature between the mold and the substrate is smaller than a threshold value.
An imprint apparatus for forming a pattern of an imprint material on a process area of a substrate by using a mold including a patterned portion, the apparatus comprising:
- a substrate heating unit configured to heat the substrate by applying first light to the substrate, the first light having a light absorption rate for the substrate higher than a light absorption rate for the mold;
- and
- a mold heating unit configured to heat the mold by applying second light to the mold, the second light having a light absorption rate for the mold higher than a light absorption rate for the substrate,
- wherein the substrate heating unit applies the first light to the substrate such that a difference in shape between the process area and the patterned portion is reduced, and
- wherein the mold heating unit applies the second light to the mold such that a difference in temperature between the mold and the substrate irradiated with the first light is smaller than a threshold value.
A method of imprinting for forming a pattern of an imprint material on a process area of a substrate by using a mold including a patterned portion, the method comprising the steps of:
- heating the substrate such that a difference in shape between the process area and the patterned portion is reduced;
- and
- heating the mold such that a difference in temperature between the mold and the heated substrate is reduced.
A method of imprinting for forming a pattern of an imprint material on a process area of a substrate by using a mold including a patterned portion, the method comprising the steps of:
- heating the mold and the substrate by applying light to the mold and the substrate,
- wherein the heating step comprises causing a light absorbing portion to absorb part of the light and applying light that has passed through the light absorbing portion and the mold to the substrate, such that a difference in shape between the process area and the patterned portion is reduced and a difference in temperature between the patterned portion and the process area is smaller than a threshold value.
A method of imprinting for forming a pattern of an imprint material on a process area of a substrate by using a mold including a patterned portion, the method comprising the steps of:
- heating the substrate by applying first light to the substrate, the first light having a light absorption rate for the substrate higher than a light absorption rate for the mold;
- and
- heating the mold by applying second light to the mold such that a difference in temperature between the mold and the substrate irradiated with the first light is smaller than a threshold value, the second light having a light absorption rate for the mold higher than a light absorption rate for the substrate.
A method for producing an article, the method comprising the steps of:
- forming a pattern on a substrate using an imprint apparatus:
- and
- processing the substrate on which the pattern is formed in the forming step,
- wherein the imprint apparatus is an imprint apparatus for forming a pattern of an imprint material on a process area of a substrate by using a mold including a patterned portion, the apparatus comprising:
- a heating unit configured to heat the mold and the substrate,
- wherein the heating unit heats the substrate such that a difference in shape between the process area and the patterned portion is reduced, and
- wherein the heating unit heats the mold such that a difference in temperature between the mold and the heated substrate is reduced.
A mold for use in an imprint apparatus for forming a pattern of an imprint material on a substrate by using a mold including a patterned portion, the mold comprising
- an absorbing portion on a surface opposite to a surface on which the patterned portion is formed, the absorbing portion being configured to absorb light to generate heat,
- wherein a light absorption rate of the absorbing portion is determined based on a light absorption rate of the substrate and an irradiation dose of the light.
Dependencies are inferred from the claim text.