Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy
AssigneeTokyo Electron Limited
InventorsBrian J. Coppa, Deepak Vedhachalam, Francois C. Dassapa
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Abstract
Described herein are architectures, platforms and methods for acquiring optical emission spectra from an optical emission spectroscopy system by flowing a dry cleaning gas into a plasma processing chamber of the plasma processing system and igniting a plasma in the plasma processing chamber to initiate the waferless dry cleaning process.
Claims23
A method for monitoring and controlling a waferless dry cleaning process in a plasma processing system, the method comprising:
- flowing a dry cleaning gas into a plasma processing chamber of the plasma processing system;
- igniting a plasma in the plasma processing chamber to initiate the waferless dry cleaning process;
- and
- acquiring optical emission spectra from an optical emission spectroscopy system attached to the plasma processing chamber, during the waferless dry cleaning process.
A non-transitory machine-accessible storage medium having instructions stored thereon which cause a data processing system to perform a method for monitoring and controlling a waferless dry cleaning process in a plasma processing tool, the method comprising:
- flowing a dry cleaning gas into a plasma processing chamber of the plasma processing system;
- igniting a plasma in the plasma processing chamber to initiate the waferless dry cleaning process;
- and
- acquiring optical emission spectra from an optical emission spectroscopy system attached to the plasma processing chamber, during the waferless dry cleaning process.
A plasma processing system comprising:
- one or more controllers;
- a plasma processing chamber;
- a process gas supply system controlled by the one or more controllers, that flows into the plasma processing chamber, wherein the one or more controllers initiate an ignition of a plasma in the plasma processing chamber to initiate the waferless dry cleaning process;
- and
- an optical spectroscopy system attached to the plasma processing chamber that acquires optical emission spectra during the waferless dry cleaning process.
Dependencies are inferred from the claim text.