Fluid handling device
AssigneeEnplas Corporation
InventorKoichi ONO
Life of this patent
Estimating the term…
Loading patent…
AssigneeEnplas Corporation
InventorKoichi ONO
Estimating the term…
A fluid handling device includes: a substrate including a first surface and a second surface which are opposite to each other, wherein a first recess which allows fluid to flow therethrough is formed on the first surface; a film including a third surface and a fourth surface which are opposite to each other, wherein at least a pair of second recesses is formed on the third surface; and at least a pair of electrodes whose shape is defined by the second recesses, the electrodes being disposed in the second recesses and configured to apply an electric field to an inside of the first recess, the film being joined to the substrate such that the first surface and the fourth surface face each other.
A fluid handling device comprising:
Dependencies are inferred from the claim text.