Etching mask, manufacturing method therefor, porous membrane manufacturing method using etching mask, porous membrane, fine dust-blocking mask including porous membrane, and manufacturing method for surface enhanced raman scattering active substrate

Abstract

The present disclosure provides an etching mask, a method for manufacturing the same, a method for manufacturing a porous membrane using the same, a porous membrane, a fine dust blocking mask including the same, and a method for manufacturing a surface enhanced Raman scattering active substrate. In this connection, the etching mask includes an organic film; and a pattern layer disposed on the organic film, wherein the pattern layer has openings defined therein having a uniform size, wherein each of the openings includes a micro-scale or nano-scale hole.

Dependencies are inferred from the claim text.