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US 2017/0257950 A1Published application
Polysiloxane Films and Methods of Making Polysiloxane Films
AssigneeMotorola Mobility LLC
InventorsRichard W. Brotzman, Ernest Sirois, Deborah Paskiewicz
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Abstract
A method of forming a polysiloxane film on a substrate comprises polymerizing a siloxane monomer in a reaction chamber containing the substrate. The polymerization is catalyzed by a 30-60 W radio frequency plasma, the pressure in the reaction chamber during the polymerization is 100-400 mTorr, the residence time of the siloxane monomer in the reaction chamber is 5-120 minutes, the siloxane monomer is heated to 30-200° C. before entering the reaction chamber, and the polymerization is carried out at a temperature of 30-100° C.
Claims18
A method comprising:
- forming a polysiloxane film on a substrate and an electrical component of the substrate, the polysiloxane film electro-chemically isolating the electrical component;
- wherein forming the polysiloxane film comprises:
- polymerizing a siloxane monomer in a reaction chamber containing the electrical component on the substrate;
- and
- wherein the polymerization is catalyzed by a 30-60 W radio frequency plasma and the pressure in the reaction chamber during the polymerization is 100-400 mTorr.
2 more elements
Dependencies are inferred from the claim text.