Semiconductor Device Comprising a First Gate Electrode and a Second Gate Electrode
AssigneeInfineon Technologies AG
InventorAndreas Meiser
Life of this patent
Estimating the term…
Loading patent…
AssigneeInfineon Technologies AG
InventorAndreas Meiser
Estimating the term…
A semiconductor device includes a transistor. The transistor includes a source region and a drain region disposed adjacent to a first main surface of a semiconductor substrate, a first gate electrode and a second gate electrode, the first gate electrode being disconnected from the second gate electrode. The transistor further includes a body region. The first gate electrode is adjacent to a first portion of the body region and the second gate electrode is adjacent to a second portion of the body region. The transistor further includes first trenches patterning the first portion of the body region into a first ridge, and second trenches patterning the second portion of the body region into a second ridge. The first gate electrode is arranged in at least one of first trenches, and the second gate electrode is arranged in at least one of the second trenches.
A semiconductor device comprising a transistor, the transistor comprising:
Dependencies are inferred from the claim text.