Coplanar Metal-Insulator-Metal Capacitive Structure

A metal-insulator-metal (MIM) capacitor structure comprising:

• a first metal layer disposed over a substrate, the first metal layer having a top surface facing away from the substrate and an opposing bottom surface facing the substrate;
• a second metal layer disposed over the substrate, the second metal layer having a top surface facing away from the substrate and an opposing bottom surface facing the substrate, the top surface of the second metal layer being substantially coplanar with the top surface of the first metal layer;
• and
• an insulator layer disposed between the first metal layer and the second metal layer, the insulator layer having a top surface facing away from the substrate and an opposing bottom surface facing the substrate, the bottom surface of the insulator layer being substantially coplanar with the bottom surface of the first metal layer.

A metal-insulator-metal (MIM) capacitor structure, comprising:

• a substrate;
• a first metal layer disposed on the substrate;
• an insulator layer disposed on the substrate that is adjacent a sidewall of the first metal layer;
• and
• a second metal layer disposed on the substrate that is a adjacent sidewall of the insulator layer, wherein the first metal layer has a top surface that is substantially coplanar with a top surface of the second metal layer.