Substrate processing device

A substrate processing apparatus comprising:

• a substrate holding unit which rotates a substrate while holding the substrate;
• a chemical-liquid nozzle which discharges a chemical liquid toward the substrate held by the substrate holding unit;
• a cylindrical processing liquid capturing unit which receives a processing liquid scattered from the substrate held by the substrate holding unit;
• a circulation pipe which defines a circulation path through which a chemical liquid within a chemical-liquid tank in which a chemical liquid to be supplied to the chemical-liquid nozzle is stored is circulated;
• a supply pipe which guides, to the chemical-liquid nozzle, the chemical liquid supplied from the chemical-liquid tank to the circulation pipe;
• a supply valve which is switched between an open state where the chemical liquid flowing within the supply pipe toward the chemical-liquid nozzle is passed and a closed state where the supply of the chemical liquid from the supply pipe to the chemical-liquid nozzle is stopped;
• a recovery pipe which guides the chemical liquid from the processing liquid capturing unit to the chemical-liquid tank;
• and
• a branch pipe which guides the chemical liquid within the circulation pipe to the recovery pipe.