Substrate processing apparatus, substrate processing method, and storage medium

A substrate processing method for drying a substrate in a chamber, comprising:

• supplying a supercritical processing liquid that contains hydrofluoroolefin and is stored in a reservoir to the substrate unit, before or after the substrate is accommodated in the chamber;
• heating an inside of the chamber in a state where the substrate is accommodated in the chamber to change the supercritical processing liquid supplied to the substrate into a supercritical fluid or a subcritical fluid;
• and
• discharging the supercritical fluid or the subcritical fluid from the chamber.

A substrate processing apparatus comprising:

• a dry processing unit that performs a dry processing to dry a substrate;
• and
• a controller that controls operations of the dry processing unit,
• wherein the dry processing unit includes:
• a chamber that accommodates the substrate;
• a dialkyl ether supply unit that supplies a liquid dialkyl ether represented by R1—O—R2 (wherein R1 and R2 represent the same or different alkyl groups) to the substrate;
• a heating unit that heats an inside of the chamber;
• and
• a discharge unit that discharges a fluid in the chamber from the chamber, and
• wherein the controller controls the dialkyl ether supply unit, the heating unit, and the discharge unit such that the liquid dialkyl ether is supplied to the substrate by the dialkyl ether supply unit before or after the substrate is accommodated in the chamber, the inside of the chamber is heated by the heating unit in a state where the substrate is accommodated in the chamber to change the supercritical processing liquid into a supercritical fluid or a subcritical fluid, and then, the supercritical fluid or the subcritical fluid is discharged from the chamber by the discharge unit.

A substrate processing method for drying a substrate in a chamber, comprising:

• supplying a liquid dialkyl ether represented by R1—O—R2 (wherein R1 and R2 represent the same or different alkyl groups) to the substrate unit before or after the substrate is accommodated in the chamber;
• heating an inside of the chamber in a state where the substrate is accommodated in the chamber to change the liquid diethyl ether supplied to the substrate into a supercritical fluid or a subcritical fluid;
• and
• discharging the supercritical fluid or the subcritical fluid from the chamber.