Mass analysis method and inductively coupled plasma mass spectrometer
AssigneeShimadzu Corporation
InventorTadashi Taniguchi
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AssigneeShimadzu Corporation
InventorTadashi Taniguchi
Estimating the term…
An Inductively Coupled Plasma Mass Spectrometer including: a plasma ionization part; a mass analysis part; a storage part that stores ion information about mass-charge ratios and presence ratios of isotopic ions of all elements and mass-charge ratios and generation probabilities of compound ions and multivalent ions generated when the measuring object samples are plasma-ionized; a representative sample measuring part; and an element-containing inferring part that infers types of elements contained in the representative sample; an interference ion judgment part that, respective target elements in the inferred elements, judges according to ion information whether there are isotopes without interference ions; a determination part of measurement mass-charge ratio that determines the mass-charge ratio of the isotope without interference ions and a mass-charge ratio of an isotope whose a mass peak has the maximum intensity obtained by subtracting the intensity as a mass-charge ratio for measurement; and an all-sample measuring part.
A mass analysis method, which is a method that uses an Inductively Coupled Plasma Mass Spectrometer (ICP-MS) to measure pre-determined one or more target elements for multiple measuring object samples, the ICP-MS having a plasma ionization part that plasma-ionizes the measuring object samples through an ICP and a mass analysis part that mass-separates ions generated in the plasma ionization part and detects the ions, wherein the mass analysis method comprises:
An Inductively Coupled Plasma Mass Spectrometer (ICP-MS), for measuring pre-determined one or more target elements for multiple measuring object samples, the ICP-MS comprising:
Dependencies are inferred from the claim text.