Inspection method and system and a method of inspecting a semiconductor device using the same
AssigneeSamsung Electronics Co., Ltd.
InventorsWoongkyu Son, Sangkyo Lim, Sunhee Shim, MiJung Jeon
Life of this patent
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Abstract
A method of inspecting a sample includes performing a focusing operation on a target pattern of a sample. The focusing operation includes scanning the target pattern at different focusing levels to obtain a plurality of focus images. The method further includes using at least one of the plurality of the focus images as a target pattern image of the target pattern and then measuring a dimension of the target pattern based on the target pattern image.
Claims21
A method of inspecting a sample, comprising:
- performing a focusing operation on a target pattern of a sample, wherein the focusing operation comprises scanning the target pattern at different focusing levels to obtain a plurality of focus images;
- using at least one of the plurality of the focus images as a target pattern image of the target pattern;
- and
- measuring a dimension of the target pattern based on the target pattern image.
A system for inspecting a sample, comprising:
- an image scanning unit configured to obtain an image of a pattern formed on a sample;
- a controller configured to control the image scanning unit, wherein the controller is configured to control the image scanning unit to perform a scanning operation on the pattern at different focusing levels and to obtain a plurality of the focus images;
- and
- a data processing unit configured to store at least one of the plurality of focus images as a pattern image of the pattern and to measure a dimension of the pattern based on the pattern image.
16-20. (canceled)
A method of inspecting a sample, comprising:
- performing a focusing operation on a pattern of a sample, wherein the focusing operation comprises scanning the pattern at different focusing levels spaced apart from each other in a first direction to obtain a plurality of focus images;
- using at least one of the plurality of the focus images as a pattern image of the pattern;
- and
- measuring a dimension of the pattern based on the pattern image.
Dependencies are inferred from the claim text.