A making method of an exposure apparatus that exposes a substrate with an illumination light via a projection optical system and a liquid, the method comprising:
- providing a frame member that supports the projection optical system in an exposure station where exposure of the substrate is performed via the projection optical system and the liquid;
- providing a detection system at the frame member in a measurement station, the detection system detecting a mark of the substrate, and the measurement station being different from the exposure station in position in a first direction within a predetermined plane that is orthogonal to an optical axis of the projection optical system;
- providing a base member whose surface is disposed almost parallel to the predetermined plane, below the projection optical system and the detection system;
- providing a first stage and a second stage each of which is disposed on the base member and has a holder to hold a substrate;
- providing a nozzle member to surround an optical element, in contact with the liquid, of the projection optical system, the nozzle member forming a liquid immersion area under the projection optical system with the liquid;
- providing a drive system that has a planar motor and moves each of the first and the second stages from one of the exposure station and the measurement station to the other, the planar motor having a stator provided at the base member and a mover provided at the first and the second stages;
- providing an encoder system that has a plurality of head members and measures positional information of the first and the second stages in the exposure station and the measurement station, each of the plurality of head members irradiating a grating section having a reflection-type two-dimensional grating with a measurement beam, the grating section being provided at one of the frame member and the first and the second stages, and the plurality of head members being provided at the other of the frame member and the first and the second stages;
- and
- providing a controller coupled to the drive system, the controller controlling the drive system based on the positional information measured with the encoder system, wherein
- in the measurement station, exchange of a substrate held by the first stage and exchange of a substrate held by the second stage are performed,
- a cable is connected to the first stage from one side in a second direction and another cable is connected to the second stage from an other side in the second direction, the second direction being orthogonal to the first direction within the predetermined plane,
- the controller relatively moves the first and the second stages so that with respect to one stage of the first and the second stages placed facing the projection optical system, an other stage of the first and the second stages comes closer, and the controller moves the first and the second stages that are closer together, relative to the nozzle member, so that the other stage is placed to face the projection optical system instead of the one stage, while substantially maintaining the liquid immersion area under the projection optical system, and
- the controller moves the first stage on one side in the second direction with respect to the projection optical system and moves the second stage on the other side in the second direction with respect to the projection optical system, in order to move each of the first and the second stages from one of the exposure station and the measurement station to the other