Lithographic apparatus and surface cleaning method

An immersion lithographic apparatus, comprising:

• a movable table;
• a projection system configured to project a radiation beam onto a radiation-sensitive substrate;
• a fluid handling structure located above the table and configured to at least party confine an immersion liquid within a space between the projection system and the movable table, the fluid handling structure comprising a recovery opening configured to recover immersion liquid into a chamber, the recovery opening comprising a porous member through which immersion liquid is recovered;
• a fluid opening located above the table and located outward, relative to the path of the beam through the space, of the porous member;
• and
• a control system configured to cause supply of a cleaning fluid of different composition than the immersion liquid within the fluid handling structure to the chamber of the recovery opening such that the recovery opening supplies the cleaning fluid from the chamber to the space during a cleaning operation and to cause the fluid opening to recover fluid at least during the cleaning operation.

An immersion lithographic apparatus, comprising:

• a movable table;
• a projection system configured to project a radiation beam onto a radiation-sensitive substrate;
• a fluid handling structure located above the table and configured to at least party confine an immersion liquid within a space between the projection system and the movable table, the fluid handling structure, comprising a first recovery opening configured to recover immersion liquid, the first recovery opening comprising a porous member through which immersion liquid is recovered;
• a fluid supply opening located above the table and outward, relative to the path of the beam through the space, of the porous member;
• a second recovery opening located above the table and outward, relative to the path of the beam through the space, of the first recovery opening, the second recovery opening configured to recover fluid;
• and
• a control system configured to cause supply of a cleaning fluid of different composition than the immersion liquid by the fluid supply opening during a cleaning operation.

A device manufacturing method comprising:

• at least party confining an immersion liquid within a space between a projection system of a lithographic apparatus and a movable table of the lithographic apparatus using a fluid handling structure of the lithographic apparatus located above the table;
• recovering immersion liquid from the space into a chamber within the fluid handling structure via a porous member of the fluid handling structure;
• projecting a radiation beam through the immersion liquid onto a radiation-sensitive substrate;
• during a cleaning operation, causing supply of a cleaning fluid of different composition than the immersion liquid within the fluid handling structure to the chamber of the porous member such that the porous member supplies the cleaning fluid from the chamber to the space;
• and
• at least during the cleaning operation, causing a fluid opening to recover fluid, the fluid opening located above the table and located outward, relative to the path of the beam through the space, of the porous member.