Shutter unit, lithography apparatus, and method of manufacturing article
AssigneeCanon Kabushiki Kaisha
InventorAtsushi Hatamoto
Life of this patent
Estimating the term…
Abstract
A shutter unit that opens and closes an optical path of light for a lithography apparatus is provided. The shutter unit includes a motor which rotatably drives a shaft extended along a rotation axis of the motor, and a plurality of shutter members attached to the shaft, each including a light shielding portion and a light transmissive portion. The shutter unit further includes a partition plate arranged at a location between the shutter members to avoid a portion through which a light beam passes and configured to shield light that has leaked from a front stage shutter member.
Claims7
A shutter unit that opens and closes an optical path of light for a lithography apparatus, comprising:
- a motor configured to rotatably drive a shaft extended along a rotation axis of the motor;
- a plurality of shutter members attached to the shaft, each including a light shielding portion and a light transmissive portion and configured to open and close the optical path by rotating in a direction in which the light shielding portion and the light transmissive portion cross the optical path;
- and
- a partition plate arranged at a location between the plurality of shutter members to avoid a portion through which a light beam passes and configured to shield light that has leaked from a front stage shutter member.
A lithography apparatus that forms a pattern of an original on a substrate, comprising:
- an illumination optical system configured to illuminate the original,
- the illumination optical system including a shutter unit configured to open and close an optical path of a light,
- the shutter unit including
- a motor configured to rotatably drive a shaft extended along a rotation axis of the motor,
- a plurality of shutter members attached to the shaft, each including a light shielding portion and a light transmissive portion and configured to open and close the optical path by rotating in a direction in which the light shielding portion and the light transmissive portion cross the optical path, and
- a partition plate arranged at a location between the plurality of shutter members to avoid a portion through which a light beam passes and configured to shield a light that has leaked from a front stage shutter.
A method of manufacturing an article, comprising:
- forming a pattern of an original on a substrate by using a lithography apparatus;
- and
- processing the substrate on which the pattern has been formed by the forming,
- the lithography apparatus including an illumination optical system configured to illuminate the original,
- the illumination optical system including a shutter unit configured to open and close an optical path of a light,
- the shutter unit including
- a motor configured to rotatably drive a shaft extended along a rotation axis of the motor,
- a plurality of shutter members attached to the shaft, each including a light shielding portion and a light transmissive portion and configured to open and close the optical path by rotating in a direction in which the light shielding portion and the light transmissive portion cross the optical path, and
- a partition plate arranged at a location between the plurality of shutter members to avoid a portion through which a light beam passes and configured to shield a light that has leaked from a front stage shutter.
Dependencies are inferred from the claim text.