Mirror, in particular collector mirror for microlithography
AssigneeCarl Zeiss SMT GmbH
InventorMarkus Bauer
Life of this patent
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AssigneeCarl Zeiss SMT GmbH
InventorMarkus Bauer
Estimating the term…
A collector mirror for an EUV microlithography system. The collector mirror includes an optical grating having an optically effective mirror surface, which reflects electromagnetic used rays in an EUV spectral range emanating from a first focal point and focuses them onto a second focal point. The first and second focal points lie on a side of the optical grating facing the mirror surface and define an optical axis. The optical grating is configured, in interaction with a stop arranged at the second focal point, to allow the used rays to pass through the stop and to block electromagnetic remaining rays in a remaining spectral range different than the EUV spectral range. The optical grating includes a blazed grating composed of a plurality of mirror facets, each having a facet surface. The facet surfaces form the mirror surface of the blazed grating.
A mirror, comprising:
Dependencies are inferred from the claim text.