Method for patterning quantum dot layer and method for manufacturing quantum dot color filter

A method for manufacturing a quantum dot color filter, comprising the following steps:

• (1) providing a base plate, the base plate comprising a red sub-pixel zone, a green sub-pixel zone, and a blue sub-pixel zone;
• and
• (2) forming, on the base plate, a patterned red quantum dot layer corresponding to the red sub-pixel zone;
• a patterned green quantum dot layer corresponding to the green sub-pixel zone;
• and a patterned blue quantum dot layer or an organic transparent photoresist layer corresponding to the blue sub-pixel zone,
• wherein the patterned red quantum dot layer, the patterned green quantum dot layer, and the patterned blue quantum dot layer are respectively formed of a red quantum dot paste, a green quantum dot paste, and a blue quantum dot paste;
• and
• wherein a patterning process for forming each of the patterned red quantum dot layer, the patterned green quantum dot layer, and the patterned blue quantum dot layer comprises the following steps:
• (1′) providing a base plate and coating a monocolor quantum dot paste on the base plate so as to obtain a monocolor quantum dot layer after curing, the monocolor quantum dot layer emitting monochromatic light of a color corresponding thereto upon excited by external light;
• (2′) coating a photoresist on the monocolor quantum dot layer to form a photoresist film and applying a mask to subject the photoresist film to exposure and development and baking so as to form a photoresist layer;
• and
• (3′) using the photoresist layer as a shielding layer to subject the monocolor quantum dot layer to etching for removing a portion of the monocolor quantum dot layer that is not shielded by the photoresist layer so as to form a patterned monocolor quantum dot layer.