Quantum dot color filter substrate and manufacturing method thereof
AssigneeShenzhen China Star Optoelectronics Technology Co., Ltd.
InventorDongze Li
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AssigneeShenzhen China Star Optoelectronics Technology Co., Ltd.
InventorDongze Li
Estimating the term…
The invention discloses a QD CF substrate and manufacturing method thereof. The manufacturing method uses high power UV light irradiation on the QD material in the QD gel for prolonged period of time to perform selective quenching to obtain a selectively quenched QD layer, i.e., patterning the QD layer without etching process, achieve simplifying the QD CF substrate manufacturing process and reduce production cost. The QD CF substrate uses selectively quenched QD layer obtain by UV light irradiation technology to achieve improve the color gamut of display as well as simplifying manufacturing process. Moreover, the QD layer comprises no blue QD material, but uses blue backlight and organic transparent photo-resist layer to improve light utilization efficiency as well as reduce material cost.
A manufacturing method for quantum dot (QD) color filter (CF) substrate, which comprises:
A quantum dot (QD) color filter (CF) substrate, which comprises:
A quantum dot (QD) color filter (CF) substrate, which comprises:
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