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US 2017/0254592 A1Published application
Thermal treatment device
AssigneesIHI Corporation, IHI Machinery and Furnace Co., Ltd.
InventorKazuhiko KATSUMATA
Life of this patent
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Abstract
A thermal treatment device includes a heating chamber which heats an object to be treated; and a moisture removal chamber which is provided adjacent to the heating chamber to put in and out of the object to be treated toward the heating chamber, and in which a vacuum atmosphere is created in the periphery of the object to be treated.
Claims13
A thermal treatment device comprising:
- a heating chamber which heats an object to be treated;
- and
- a moisture removal chamber which is provided adjacent to the heating chamber to put in and out of the object to be treated toward the heating chamber, and in which a vacuum atmosphere is created in the periphery of the object to be treated.
Dependencies are inferred from the claim text.