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US 2017/0253969 A1Published application
Vaporization raw material supplying device and substrate processing apparatus using the same
AssigneeTokyo Electron Limited
InventorsKenji INABA, Satoru KOIKE
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Abstract
There is provided a vaporization raw material supplying device, including; a single vaporization raw material producing part configured to vaporize a raw material to produce a vaporization raw material; a plurality of branch pipes connected to the single vaporization raw material producing part and configured to distribute the produced vaporization raw material in multiple channels; and a plurality of mass flow controllers installed respectively in the plurality of branch pipes.
Claims21
A vaporization raw material supplying device, comprising;
- a single vaporization raw material producing part configured to vaporize a raw material to produce a vaporization raw material;
- a plurality of branch pipes connected to the single vaporization raw material producing part and configured to distribute the produced vaporization raw material in multiple channels;
- and
- a plurality of mass flow controllers installed respectively in the plurality of branch pipes.
1 more element
Dependencies are inferred from the claim text.