Substrate processing apparatus

A substrate processing apparatus comprising:

• a plurality of processing chambers where a substrate is processed;
• a vacuum transfer chamber wherein the substrate is transferred;
• a plurality of transfer chambers disposed between the vacuum transfer chamber and the plurality of processing chambers, each of the plurality of transfer chambers corresponding to each of the plurality of processing chambers;
• a plurality of gate valves disposed between the vacuum transfer chamber and plurality of transfer chambers, each of the plurality of gate valves corresponding to each of the plurality of processing chambers;
• a plurality of first gas supply units configured to supply an inert gas to the substrate when the substrate passes through the plurality of gate valves, each of the plurality of first, gas supply units corresponding to each of the plurality of gate valves;
• a transfer robot disposed in the vacuum transfer chamber and configured to transfer the substrate into the plurality of transfer chambers;
• and
• a control unit configured to control the plurality of first gas supply units and the transfer robot to:
• supply the inert gas to the substrate at a first flow rate when a distance between a gas supply port configured to supply the inert gas therethrough and the substrate passing through the plurality of gate valves is a first distance;
• and supply the inert gas to the substrate at a second flow rate greater than the first flow rate when the distance between the gas supply port and the substrate passing through the plurality of gate valves is a second distance greater than the first distance when the substrate passes through the plurality of gate valves.